Product Information

Chemicals for photolithography

Application
Electronics components
Material
Etching, remover

Semiconductor devices are becoming increasingly ultra-fine, and flat panel displays are becoming increasingly high-definition and highly functional. We manufacture various products such as photoresist (light sensitive material) and resist stripping agent which require rapid development capabilities in the ever advancing world of semiconductor and flat panel display manufacturing. Furthermore, we also contribute to the expansion for the electronics industry such as with an excellent track record of proposal capabilities for customers in terms of process management.

Resist Stripping Agents

Application Product Name Liquid Usage Conditions Rinse Liquid Stripping Capabilities AL
Corrosivity 		Viscosity Regulations
℃/Minute Positive Removal Residue Removal mPa･s
(25℃) 		Fire Protection Law PRTR
FPD N-327 Water-based Room temperature～50
/1～5 		Water ○ ○ ◎ 8 Not applicable Not applicable
N-342 Water-based Room temperature～50
/1～5 		Water ○ ◎ ○ 10 Not applicable Applicable
N-300 Not Water-based 60～120
/1～20 		Alcohol ◎ ○ ◎ 10 4 class
 Applicable
Semiconductors N-530 Not Water-based 80～100
/10～20 		Solvent ◎ ◎ ◎ 3 4 class Applicable
N-530HS Not Water-based 80～100
/10～20 		Solvent ◎ ◎ ◎ 6 4 class Applicable

Note: Ask us directly for details about the following series.

  • ACT series
  • Resist stripping agent for Cu wiring
  • Stripping agent for thick film resist (positive/negative)
  • Dry etching and ashing residue removal agent for Al Cu/p-Lowk
  • Stripping agent for dry film resist

Etching agents

Cr etchant : We offer a lineup of various types of etching liquids.
Al etchant : We offer a lineup of various types of etching liquids.
ITO etchant : We offer a lineup of various types of etching liquids.
Cu etchant : We will investigate to suit the customer needs.

Note: Ask us directly for details about other materials.

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Inquiries