Chemicals for photolithography
Semiconductor devices are becoming increasingly ultra-fine, and flat panel displays are becoming increasingly high-definition and highly functional. We manufacture various products such as photoresist (light sensitive material) and resist stripping agent which require rapid development capabilities in the ever advancing world of semiconductor and flat panel display manufacturing. Furthermore, we also contribute to the expansion for the electronics industry such as with an excellent track record of proposal capabilities for customers in terms of process management.
Resist Stripping Agents
|Application||Product Name||Liquid||Usage Conditions||Rinse Liquid||Stripping Capabilities||AL
|℃/Minute||Positive Removal||Residue Removal||mPa･s
|Fire Protection Law||PRTR|
|Water||○||○||◎||8||Not applicable||Not applicable|
Note: Ask us directly for details about the following series.
- ACT series
- Resist stripping agent for Cu wiring
- Stripping agent for thick film resist (positive/negative)
- Dry etching and ashing residue removal agent for Al Cu/p-Lowk
- Stripping agent for dry film resist
|Cr etchant||:||We offer a lineup of various types of etching liquids.|
|Al etchant||:||We offer a lineup of various types of etching liquids.|
|ITO etchant||:||We offer a lineup of various types of etching liquids.|
|Cu etchant||:||We will investigate to suit the customer needs.|
Note: Ask us directly for details about other materials.