Product Information

Chemicals for photolithography

Ultrafine detail semiconductor devices and flat panel displays are becoming ever more highly detailed and highly functional. We manufacture various products such as photoresist (light sensitive material) and resist stripping agent which require rapid development capabilities in the ever advancing world of semiconductor and flat panel display manufacturing. Furthermore, we also contribute to the expansion for the electronics industry such as with an excellent track record of proposal capabilities for customers in terms of process management.

Resist Stripping Agents

Application Product Name Liquid Usage Conditions Rinse Liquid Stripping Capabilities AL
Corrosivity
Viscosity Regulations
℃/Minute Positive Removal Residue Removal mPa・s
(25℃)
Fire Protection Law PRTR
FPD N-327 Water-based Room temperature~50
/1~5
Water 8 Not applicable Not applicable
N-342 Water-based Room temperature~50
/1~5
Water 10 Not applicable Applicable
N-300 Not Water-based 60~120
/1~20
Alcohol 10 4 class
Applicable
Semiconductors N-530 Not Water-based 80~100
/10~20
Solvent 3 4 class Applicable
N-530HS Not Water-based 80~100
/10~20
Solvent 6 4 class Applicable

Note: Ask us directly for details about the following series.

  • ACT series
  • Resist stripping agent for Cu wiring
  • Stripping agent for thick film resist (positive/negative)
  • Dry etching and ashing residue removal agent for Al Cu/p-Lowk
  • Stripping agent for dry film resist

Etching agents

Cr etchant : We offer a lineup of various types of etching liquids.
Al etchant : We offer a lineup of various types of etching liquids.
ITO etchant : We offer a lineup of various types of etching liquids.
Cu etchant : We will investigate to suit the customer needs.

Note: Ask us directly for details about other materials.

Photoresist for Detailed Line Pattern Formation

● For lift-off processes NPR9700 series

  • Positive resist for lift-off processes
  • Can be exposed with g rays to i rays
  • Simply putty shape formation is possible without using special processes
  • Reduces costs by eliminating the etching process
  • Reduces costs by eliminating the etching process
  • In addition, we can provide the viscosity to suit the desired film thickness
    Example applications: Electronics materials

After developing

● For metal etching GRX-M series

  • Positive resist for metal etching
  • Enables coating using spin coaters and CAP coaters. Ensures highly uniform coatings over large area substrates
  • Can be exposed with g rays to i rays. Laser rendering is possible
  • Supports organic and inorganic developing
  • Has high resolution (≈0.5 μm) and wide developing margins
  • Excellent adhesion (low side etching)
  • Good stripping properties
  • Example applications: Liquid crystal displays

● We also develop various other special resists and photosensitive insulating films, etc. Feel free to ask us.

After wet etching

Inquiries

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Inquiries