Consider for a moment extraordinarily minute semiconductor devices and ever smaller and more highly functional flat panel display. The pace of change in the world of semiconductor and flat panels manufacturing can be bewildering. For these industries, where rapid development capabilities are in high demand, Nagase ChemteX manufactures a variety of products including photoresist (photosensitive materials) and resist delaminates. Additionally, our superior track record in proposing process management solutions for our customers allows us to further contribute to the development of the electronics industry.

 

 
 
Photoresists   Developers
    Positive I-line photoresists for LSI process tecnologies (ultra-high resolution)       Tetramethylammonium hydroxides (TMAH) types.
          Inorganic types
    Positive g-line photoresists for LSI process tecnologies (ultra-high resolution)   Etchants
           
    Thick film for lift-off process        
    Positive type for liquid crystal displays.          
Resist delaminates strippes      
    Non-aqueous and aqueous for LSI process        
    Non-aqueous and aqueous for        
    liquid crystal displays        
    For use with both positive and negative types        
 

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